Aluminum Nitride (AlN) sputtering targets are solid ceramic sources of aluminum nitride, a nitride compound of aluminum and nitrogen. They are used in physical vapor deposition (sputtering) to form thin films on substrates for research and industrial processes.
- Quantity: 1 piece
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- Deposition of thin dielectric layers for electronic substrates and packaging
- Piezoelectric thin films for MEMS devices and acoustic resonators
- Optical and protective coatings in thin-film research
- Development of wide-bandgap semiconductor and nitride film structures
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