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Nanografi

Aluminum Silicon (AlSi) Sputtering Targets

Aluminum Silicon (AlSi) Sputtering Targets
Regular price Rp 8.783.000,00
Regular price Sale price Rp 8.783.000,00
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Aluminum silicon (AlSi) sputtering targets are solid alloy plates used as source material in physical vapor deposition (PVD) sputtering systems. Aluminum-silicon is a metallic alloy class widely studied for depositing conductive and structural thin films. This Nanografi product is supplied through AMI Scientific for laboratory and research use.

  • Quantity: 1 piece

Contact AMI Scientific for technical specifications, CoA, or a quotation.

  • Metallization and conductive layer research in thin-film electronics
  • Deposition of metal alloy films for surface and coating studies
  • Process development for PVD sputtering systems in university and R&D laboratories
  • Prototype fabrication of interconnect and electrode structures

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