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Nanografi

NG 7.04.01. Target Sputtering Cerium Oksida Target Sputtering Cerium Oksida (CeO2), indium, Kemurnian: 99,99%, Ukuran: 4'', Ketebalan: 0,125'' 1 buah

NG 7.04.01. Target Sputtering Cerium Oksida Target Sputtering Cerium Oksida (CeO2), indium, Kemurnian: 99,99%, Ukuran: 4'', Ketebalan: 0,125'' 1 buah

Rp 57.718.980,00
Rp 57.718.980,00
Obral Habis
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General Characteristics (Material):

  • Nama Material: Cerium Oxide (CeO2) Sputtering Targets, indium, Purity: 99.99%, Size: 4'', Thickness: 0.125'' 1 pcs
  • Vendor: Nanografi
  • Kategori: Advanced Materials
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