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TCI

CAS 2386-87-0

(7-Oxabicyclo[410]heptan-3-yl)methyl 7-Oxabicyclo[410]heptane-3-carboxylate (mixture of isomers) TCI E1611

(7-Oxabicyclo[410]heptan-3-yl)methyl 7-Oxabicyclo[410]heptane-3-carboxylate (mixture of isomers) TCI E1611
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Description

(7-Oxabicyclo[4.1.0]heptan-3-yl)methyl 7-Oxabicyclo[4.1.0]heptane-3-carboxylate is a cycloaliphatic diepoxide that carries two epoxide rings attached to cyclohexane skeletons and joined together by an ester bridge. The compound is supplied as a mixture of isomers, as is customary for monomers of this type. In the laboratory it is known as a cycloaliphatic epoxy monomer that forms the backbone of resin systems which cure through cationic polymerisation, particularly in research on coatings and inks cured by ultraviolet light.

The property that makes it a preferred choice is the high reactivity of its cycloaliphatic epoxide groups toward cationic initiators, which is markedly different from conventional glycidyl epoxy resins that are generally cured with amines. The molecule contains no aromatic rings, so the polymer network that forms tends to resist yellowing on light exposure and shows good weathering resistance. Its relatively low viscosity for a difunctional monomer makes mixing and coating straightforward without much additional solvent, while the two epoxide groups ensure the formation of a tightly crosslinked network with good surface hardness and stability.

In Indonesian laboratories this material is typically found in polymer and coating research groups, in university materials chemistry laboratories, and in the formulation units of companies developing UV-curable systems. It is used at bench scale for preparing trial formulations, comparing initiator systems, and evaluating cured film properties before any process is considered for larger scale. AMI Scientific supplies it in TCI packaging to research and formulation laboratories across Indonesia.

Laboratory Applications

  • UV-curable coating formulation research, where its cycloaliphatic epoxide groups respond rapidly to cationic photoinitiators and build a hard crosslinked film without requiring amine curing agents.
  • Cationic photopolymerisation studies, since this monomer is a standard difunctional substrate for investigating initiator efficiency, cure kinetics, and the progression of network formation under ultraviolet irradiation.
  • Development of non-yellowing clear coatings, because the absence of aromatic rings in the molecule gives cured films better resistance to discolouration and weathering under prolonged light exposure.
  • Preparation of low-viscosity reactive diluent blends, where its modest viscosity for a difunctional monomer allows formulators to reduce added solvent while retaining good coating and wetting behaviour.
  • Printing ink and surface-hardening trials, in which the two epoxide groups produce a dense crosslinked network that supports the surface hardness and dimensional stability needed for cured ink layers.

Specifications

  • Brand: TCI (Tokyo Chemical Industry), catalogue number E1611
  • CAS number: 2386-87-0
  • Category: Chemistry > Building Blocks > Non-Heterocyclic Building Blocks
  • Composition: supplied as a mixture of isomers
  • Pack sizes: available in standard TCI research pack sizes; please confirm the currently available size when ordering
  • Storage: keep in a cool, dry place in a tightly closed original container

Handling and Storage

Store the material in its tightly closed original container in a cool, dry, well-ventilated place, away from direct sunlight, heat sources, and ignition sources. Keep it separated from strong acids and other reactive initiating species, since cycloaliphatic epoxides can polymerise when exposed to cationic species. Handle inside a fume hood using nitrile gloves, safety goggles, and a laboratory coat, as epoxide compounds may irritate skin and eyes and can act as sensitisers on repeated contact. Reseal the container promptly after use, avoid moisture ingress, and consult the manufacturer's safety data sheet before first use. Dispose of residues and contaminated materials as chemical waste according to the applicable institutional procedures.

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