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Zinc (Zn) Sputtering Targets

Zinc (Zn) Sputtering Targets
Regular price Rp 8.473.000,00
Regular price Sale price Rp 8.473.000,00
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Zinc (Zn) sputtering targets are solid metallic discs or plates used as the source material in physical vapor deposition (PVD) sputtering processes. Zinc is a widely studied metal in thin-film research, and its targets are commonly used to deposit zinc-based films, including zinc oxide layers produced by reactive sputtering.

  • 1 piece

For technical specifications, Certificate of Analysis (CoA), or quotation, please contact AMI Scientific.

  • Deposition of zinc oxide (ZnO) thin films via reactive sputtering
  • Buffer and window layer research in thin-film solar cells
  • Development of transparent conductive oxide and optoelectronic films
  • Protective and corrosion-resistant metallic coatings
  • Fundamental studies of zinc-based thin-film materials

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