Aluminum (Al) sputtering targets are solid metal sources used in physical vapor deposition (PVD). In a vacuum chamber, the target is bombarded with energetic ions, which eject aluminum atoms that condense onto a substrate as a thin film. Aluminum belongs to the metal group and is widely used for conductive and reflective thin-film layers.
- Quantity: 1 piece
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- Conductive contact and interconnect layers in thin-film electronics research
- Reflective and mirror coatings for optical components
- Thin-film prototyping for photovoltaic and display device studies
- Surface and protective coating experiments in materials science
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