Spin Coater

A spin coater deposits a uniform thin film by spinning a flat substrate at high speed so that a liquid coating spreads by centrifugal force. It is used for photoresists, polymer and perovskite films, sol-gel layers and nanomaterial coatings.

How to choose

  • Standard or Advanced: AMI supplies the Ossila Spin Coater Standard (L2001A3) and Advanced (L2001B2).
  • Dispensing: add a single or dual syringe pump for repeatable, hands-free dispensing.
  • Chuck: polypropylene (PP) or PTFE chucks, multi-substrate or custom sizes; PTFE suits aggressive solvents.

Need help choosing a model or a formal quotation (PO, tax invoice)? Contact the AMI Scientific team via WhatsApp.

13 products