This aluminum (Al) sputtering target from Nanografi is a 1'' disc, 0.250'' thick, with a purity of 99.99%. It serves as the source material in sputter deposition, where atoms are eroded from the target and deposited as a thin film onto a substrate such as a silicon wafer.
Aluminum is a soft, ductile, silvery white metal known for its light weight, strength, durability and corrosion resistance. It builds a very thin yet strong oxide layer and offers high thermal and electrical conductivity. Aluminum targets have a notably fine-grained microstructure, which supports even erosion and keeps particle formation low during sputtering.
Sputtering is a repeatable technique that can coat many substrate shapes and sizes and can be scaled from small R&D work to production batches covering medium to large areas. Its many process parameters give experienced users close control over film growth and microstructure.
- Thin film deposition of aluminum onto substrates such as silicon wafers.
- Sputter etching where high etching anisotropy is required and selectivity is not critical.
- Material analysis by etching, as in secondary ion mass spectroscopy (SIMS), to determine composition and detect trace impurities.
- Research into sputtering phenomena such as space weathering of airless bodies.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.99% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01AL03
- Material: Aluminum (Al)
- Size: 1''
- Thickness: 0.250''
- Product code: NG0ST01AL03
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