Aluminum (Al) sputtering targets are solid metal source plates used in physical vapor deposition (PVD) to produce thin films. Aluminum is a lightweight metallic element, and its targets belong to the metal sputtering target group used in laboratory and industrial coating processes.
- Quantity: 1 piece
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- Thin-film deposition for electronic and semiconductor research
- Reflective and decorative coatings for optical components
- Metallization and conductive layers in device prototyping
- Barrier and adhesion layer studies in materials research
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