Aluminum (Al) sputtering targets are solid metallic plates used as the source material in physical vapor deposition (PVD) processes, where atoms are ejected from the target and deposited onto a substrate to form thin films. Aluminum belongs to the group of lightweight metallic materials and is widely studied for its good electrical conductivity and reflectivity in thin-film form.
- Quantity: 1 piece
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- Metallization layers in thin-film electronic device research
- Reflective coatings for optical components and mirrors
- Protective and decorative thin-film coatings
- Fundamental studies of thin-film growth and deposition processes
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