Aluminum (Al) sputtering targets are solid, high-purity metal sources used in physical vapor deposition (PVD), where atoms are ejected from the target surface under plasma bombardment and deposited onto a substrate to form thin films. Listed in our nanomaterials catalog, this product belongs to the metallic sputtering target group, which is widely used in laboratory and pilot-scale thin film processes. Aluminum is a lightweight, reflective, and electrically conductive metal, making its targets a common choice for researchers developing functional coatings.
- 1 piece
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- Deposition of aluminum thin films for electronic and semiconductor research
- Reflective and optical coating development
- Conductive and barrier layer studies in thin film devices
- Surface coating and material research in university and industrial laboratories
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