This Aluminum (Al) sputtering target from Nanografi is a 3'' disc, 0.125'' thick, made from aluminum with a purity of 99.999%. It serves as the source material for sputter deposition, where material is eroded from the target and deposited as a thin film on a substrate such as a silicon wafer.
Sputtering is an established, repeatable way to coat substrates of many shapes and sizes, and it scales from small R&D work to production batches covering medium to large areas. Its many process parameters give experienced users close control over film growth and microstructure.
Aluminum is a light, soft, ductile, silvery white metal valued for its strength, durability and corrosion resistance, the latter owing to a very thin but strong oxide layer. It also conducts heat and electricity well. The target has a particularly fine-grained microstructure, which supports uniform erosion and low susceptibility to particle formation during sputtering.
- Thin film deposition of aluminum onto substrates such as silicon wafers.
- Sputter etching where high etching anisotropy is required and selectivity is not a concern.
- Materials analysis by sputtering, as in secondary ion mass spectrometry (SIMS), to determine composition and detect trace impurities.
- Research into space weathering processes affecting airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.999% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01AL10
- Material: Aluminum (Al)
- Size: 3''
- Thickness: 0.125''
- Microstructure: Fine-grained
- Product code: NG0ST01AL10
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