Aluminum (Al) sputtering targets are solid metal sources used in physical vapor deposition (PVD). During sputtering, energetic ions strike the target surface and eject aluminum atoms, which then condense onto a substrate to form a thin film. Aluminum is a widely studied metal valued for its electrical conductivity and reflectivity, and this product belongs to the metallic sputtering material group.
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- Metallic thin-film layers for electronic and semiconductor research
- Reflective and optical coatings for mirrors and sensor components
- Conductive electrode and interconnect layers in device prototyping
- Protective and decorative coatings studied in materials research
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