Aluminum (Al) sputtering targets are solid metal plates used in physical vapor deposition (PVD) processes. Ion bombardment ejects aluminum atoms from the target surface, which then deposit onto a substrate to form thin films. As a metal target in the nanomaterial category, aluminum is widely studied for conductive and reflective layers.
- Quantity: 1 piece
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- Deposition of conductive metallic thin films for electronic device research
- Reflective and optical coating development
- Barrier and interconnect layer studies in microfabrication
- Thin-film research using magnetron sputtering systems
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