This aluminum (Al) sputtering target from Nanografi is a 99.99% pure disc measuring 6'' with a thickness of 0.125''. It serves as the source material for depositing thin aluminum films by sputtering, in which material is eroded from the target and deposited onto a substrate such as a silicon wafer. The method is repeatable and suits work ranging from small R&D projects to production batches covering medium to large substrate areas.
Aluminum is a silvery white, soft and ductile metal, valued for its light weight, strength, durability and corrosion resistance. It forms a very thin yet strong oxide film and offers high thermal and electrical conductivity.
The target has a particularly fine-grained microstructure, which supports uniform erosion and a low tendency toward particle formation during sputtering. Because sputter deposition involves many process parameters, users gain considerable control over film growth and microstructure.
- Thin film deposition of aluminum onto substrates such as silicon wafers.
- Sputter etching where high etching anisotropy is required and selectivity is not a concern.
- Surface and composition analysis, for example in secondary ion mass spectrometry (SIMS), including detection of very low impurity concentrations.
- Studies related to space weathering, where sputtering alters the surfaces of airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.99% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01AL18
- Material: Aluminum (Al)
- Size: 6''
- Thickness: 0.125''
- Microstructure: Fine-grained
- Product code: NG0ST01AL18
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