This Nanografi aluminum (Al) sputtering target is a 99.999% purity disc measuring 6'' in size and 0.125'' in thickness, supplied as a single piece. It serves as the source material for depositing aluminum thin films by sputtering onto substrates such as silicon wafers.
Aluminum is a light, soft and ductile silvery white metal known for its strength, durability and corrosion resistance, which comes from a very thin yet strong oxide layer that forms on its surface. It also conducts heat and electricity well. The target has a notably fine-grained microstructure, which supports even erosion and keeps particle formation low during sputtering.
Sputter deposition is a repeatable process that works with substrates of many shapes and sizes and can move from small R&D work to production batches covering medium to large areas. Its many process parameters give experienced users close control over film growth and microstructure.
- Thin film deposition of aluminum onto substrates such as silicon wafers.
- Sputter etching in semiconductor work where high etching anisotropy is required and selectivity is not a concern.
- Material analysis by etching, for example in secondary ion mass spectroscopy (SIMS) to determine composition and detect trace impurities.
- Research into space weathering processes that alter airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.999% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01AL19
- Material: Aluminum (Al)
- Size: 6''
- Thickness: 0.125''
- Product code: NG0ST01AL19
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