Aluminum sputtering targets are solid metal sources used in physical vapor deposition (PVD). Ion bombardment ejects atoms from the target surface, which then condense onto a substrate to form a thin film. As a metallic sputtering material, aluminum targets are commonly used in laboratory coating and thin-film research.
- 1 piece
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- Thin-film conductive and electrode layers in electronics research
- Reflective coatings for optical components and mirrors
- Adhesion or barrier layer development in materials science
- Protective and decorative coating studies
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