Aluminum nitride (AlN) is a ceramic nitride compound belonging to the group of advanced technical ceramics and wide-bandgap semiconductor materials. Supplied as a sputtering target, it serves as a source material for physical vapor deposition of thin films in research and manufacturing environments.
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- Deposition of thin dielectric and insulating layers for electronic devices
- Piezoelectric thin films for MEMS and acoustic wave resonators
- Heat-spreading and protective coatings in optoelectronic research
- Process development in thin-film and semiconductor laboratories
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