Aluminum nitride (AlN) is an advanced ceramic compound of aluminum and nitrogen, belonging to the III-nitride family of wide-bandgap semiconductor materials. This Nanografi product is supplied as a sputtering target, a solid source material used in physical vapor deposition (PVD) to produce thin films of AlN on various substrates.
- Quantity: 1 piece
For technical specifications, Certificate of Analysis (CoA), or quotation, please contact AMI Scientific.
- Deposition of piezoelectric and acoustic thin films for sensors and resonator research
- Fabrication of III-nitride thin layers for optoelectronic and high-frequency device studies
- Protective and thermally conductive coatings in materials science research
- Development of dielectric and passivation layers for microelectronic prototypes
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