Aluminum Nitride (AlN) is an advanced ceramic compound of aluminum and nitrogen, classified as a wide-bandgap technical ceramic and semiconductor material. Sputtering targets are solid source plates used in physical vapor deposition (PVD) to deposit thin films onto substrates in research and industrial processes.
- Quantity: 1 piece
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- Piezoelectric thin films for MEMS resonators and acoustic filters
- Electrically insulating, thermally conductive layers in electronic devices
- Passivation and protective coatings
- Dielectric and optical thin-film research
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