Aluminum nitride (AlN) is a ceramic compound of aluminum and nitrogen, belonging to the nitride ceramics group. Supplied as a sputtering target, it is a source material for physical vapor deposition (PVD), where it is sputtered to form thin films on substrates for research and development.
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- Piezoelectric thin films for acoustic resonator research (BAW and SAW devices)
- Electrically insulating and thermally conductive layers in electronic devices
- Protective and passivation coatings on optical and semiconductor components
- Thin-film layers for optoelectronic device research, such as UV light-emitting structures
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