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Aluminum Nitride (AlN) Sputtering Targets

Aluminum Nitride (AlN) Sputtering Targets
Regular price Rp 39.707.000,00
Regular price Sale price Rp 39.707.000,00
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Aluminum Nitride (AlN) is a ceramic compound of aluminum and nitrogen, classified as a wide-bandgap engineering ceramic. It is valued for its electrical insulation, good thermal conductivity, and chemical stability. In sputtering targets form, AlN serves as a source material for physical vapor deposition, producing thin films used in research and advanced device development.

  • 1 piece

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  • Piezoelectric thin films for acoustic wave and MEMS device research
  • Dielectric and passivation layers in microelectronics studies
  • Protective and optical coatings on functional substrates
  • Thermal management layer development for electronic components

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