Aluminum nitride (AlN) is a ceramic compound of aluminum and nitrogen. It belongs to the group III-nitride family of wide-bandgap materials and technical ceramics. Sputtering targets are solid discs or plates used as the source material in physical vapor deposition, where atoms are ejected from the target and deposited onto a substrate to form thin films.
- Quantity: 1 piece
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- Piezoelectric thin films for MEMS resonators and acoustic filter research
- Dielectric and passivation layers in electronic device development
- Thermally conductive and electrically insulating coatings
- Optical and protective thin-film studies in materials research
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