Aluminum Nitride (AlN) sputtering targets are solid ceramic source materials from the nitride compound family, used in physical vapor deposition (PVD) to form thin films. AlN is valued for its wide bandgap, electrical insulation, and thermal conductivity, which make it a common choice for functional thin-film research.
- Quantity: 1 piece
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- Piezoelectric thin films for sensors and acoustic wave devices
- Dielectric and passivation coatings in microelectronics research
- Heat-spreading and insulating layers for electronic packaging studies
- Ultraviolet optoelectronic device research
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