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Nanografi

Aluminum Oxide (Al2O3) Sputtering Targets

Aluminum Oxide (Al2O3) Sputtering Targets
Regular price Rp 13.001.000,00
Regular price Sale price Rp 13.001.000,00
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Aluminum oxide (Al2O3) is a robust ceramic oxide of aluminum, known for its electrical insulation, hardness, and chemical stability. As a sputtering target, it is a solid source material used in physical vapor deposition (PVD) to deposit thin films of aluminum oxide onto substrates. This product belongs to the nanomaterial category offered under the Nanografi brand.

  • Quantity: 1 piece

Contact AMI Scientific for technical specifications, CoA, or a quotation.

  • Dielectric and insulating thin films in microelectronics research
  • Protective and barrier coatings for optical and mechanical components
  • Optical coatings for research on transparent thin-film stacks
  • Thin-film process development in PVD laboratories

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