Aluminum Oxide (Al2O3) sputtering targets are solid source plates used in physical vapor deposition (PVD) to deposit thin films onto substrates. Aluminum oxide is a ceramic metal oxide belonging to the oxide ceramics group, known for its electrically insulating and dielectric character.
- Quantity: 1 piece
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- Dielectric and insulating thin films in electronic device research
- Optical and protective coatings in materials research
- Diffusion barrier layers in thin-film studies
- Surface modification experiments in university and industrial laboratories
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