This Nanografi aluminum oxide (Al2O3) sputtering target is a 1'' disc, 0.125'' thick, with a purity of 99.999%. It serves as the source material for depositing alumina thin films by sputtering, in which material is eroded from the target and laid down on a substrate such as a silicon wafer.
Al2O3 is a compound of aluminium and oxygen known for its chemical inertness, hardness, mechanical strength, high abrasion and corrosion resistance, high electrical breakdown field and high dielectric constant. Films grown from this target are valued in mechanical, optical and microelectronic work for their insulating behaviour and transparency.
Sputtering is a repeatable process that scales from small research projects to production batches on medium to large substrate areas. Film properties depend on system parameters such as sputtering rate, target-to-substrate distance and reactive gas pressure, giving users considerable control over film growth and microstructure.
- Deposition of dielectric and insulating layers in microelectronic devices.
- Production of protective and wear-resistant coatings.
- Fabrication of diffusion barriers and electronic seals.
- Deposition of optical layers for optical and optoelectronic components.
- Thin film research in tribology, sensorics and nanolithography.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.999% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01AL48
- Material: Aluminum Oxide (Al2O3)
- Size: 1''
- Thickness: 0.125''
- Product code: NG0ST01AL48
—
—