Aluminum oxide (Al2O3) sputtering targets are ceramic oxide target materials used in physical vapor deposition (PVD) to produce thin films. Al2O3 belongs to the oxide ceramic group and is valued for its electrical insulation, chemical stability, and mechanical hardness.
- Quantity: 1 piece
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- Dielectric and insulating thin films in microelectronics research
- Protective and wear-resistant coatings studied in materials science
- Optical thin-film layers for coating research
- Barrier layers in functional thin-film development
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