This Nanografi aluminum oxide (Al2O3) sputtering target is a 99.999% purity disc measuring 1'' in size with a thickness of 0.250''. It serves as the source material for sputter deposition, where material is eroded from the target and deposited as a thin film onto a substrate such as a silicon wafer.
Al2O3 films grown from these targets are valued for chemical inertness, mechanical strength and hardness, high abrasion and corrosion resistance, a high electrical breakdown field and a high dielectric constant, along with useful insulating and optical behaviour. Film properties depend on sputtering conditions, including sputtering rate, target-to-substrate distance and reactive gas pressures.
Sputter deposition is a repeatable process that can move from small research projects to production batches covering medium to large substrate areas, while its many adjustable parameters give experienced users close control over film growth and microstructure.
- Deposition of dielectric and insulating layers for microelectronic devices.
- Production of protective coatings and diffusion barriers.
- Fabrication of optical layers and electronic seals.
- Thin-film research in optoelectronics, tribology, sensorics and nanolithography.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.999% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01AL50
- Material: Aluminum Oxide (Al2O3)
- Size: 1''
- Thickness: 0.250''
- Product code: NG0ST01AL50
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