This aluminum oxide (Al2O3) sputtering target from Nanografi is a 2'' disc, 0.250'' thick, with a purity of 99.5%. It serves as the source material for depositing alumina thin films by sputtering, in which material is eroded from the target and deposited onto a substrate such as a silicon wafer.
Alumina films are valued for their chemical inertness, hardness and mechanical strength, transparency, strong resistance to abrasion and corrosion, and good insulating behaviour, including a high electrical breakdown field and high dielectric constant. The final film properties depend on sputtering conditions such as sputtering rate, target-to-substrate distance and reactive gas pressure.
Sputtering is a repeatable process that scales from small research and development work to production batches covering medium to large substrate areas, giving users considerable control over film growth and microstructure.
- Deposition of protective alumina coatings for mechanical and wear-resistant surfaces.
- Fabrication of dielectric layers and electronic seals in microelectronic devices.
- Formation of diffusion barriers in thin-film structures.
- Deposition of optical layers for optical and optoelectronic components.
- Thin-film research in tribology, sensorics and nanolithography.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.5% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01AL51
- Material: Aluminum Oxide (Al2O3)
- Size: 2''
- Thickness: 0.250''
- Product code: NG0ST01AL51
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