Aluminum oxide (Al2O3) sputtering targets are ceramic oxide source materials used in physical vapor deposition (PVD) to form thin films. Aluminum oxide belongs to the oxide ceramics and dielectric materials group, valued for its electrical insulation, chemical stability, and hardness. These Nanografi targets are intended for laboratory and pilot-scale thin-film deposition.
- Quantity: 1 piece
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- Dielectric and insulating layers in electronic device research
- Protective and wear-resistant coatings on laboratory samples
- Optical thin-film coatings for transparent substrates
- Diffusion barrier and passivation layer studies
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