This aluminum oxide (Al2O3) sputtering target is a 2'' disc, 0.250'' thick, with a purity of 99.99%. It serves as the source material for sputter deposition, where material eroded from the target builds a thin film on a substrate such as a silicon wafer.
Al2O3, the compound of aluminium and oxygen, is valued for its hardness, high melting point and chemical inertness. Films sputtered from it offer mechanical strength, transparency, strong resistance to abrasion and corrosion, a high electrical breakdown field, a high dielectric constant and good insulating and optical behaviour. The final film properties depend on sputtering conditions, including sputtering rate, target-to-substrate distance and reactive gas pressure.
Sputtering is a repeatable process that scales from small research projects to production batches covering medium to large substrate areas, and its many adjustable parameters give close control over film growth and microstructure.
- Deposition of Al2O3 thin films for mechanical, optical and microelectronic applications.
- Production of protective coatings and diffusion barriers.
- Fabrication of dielectric layers, optical layers and electronic seals.
- Research in optoelectronics, tribology, sensorics and nanolithography using magnetron sputtering.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.99% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01AL54
- Material: Aluminum Oxide (Al2O3)
- Size: 2''
- Thickness: 0.250''
- Product code: NG0ST01AL54
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