Aluminum Oxide (Al2O3) sputtering targets are solid source materials made from alumina, a widely used oxide ceramic in the advanced materials group. During physical vapor deposition, the target is bombarded with ions so that its atoms are ejected and deposited onto a substrate, forming thin alumina films with good electrical insulation, chemical stability, and mechanical hardness.
- Quantity: 1 piece
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- Dielectric and insulating layers in thin-film electronics research
- Protective and wear-resistant coatings on laboratory and industrial components
- Optical thin films and anti-reflective coating development
- Diffusion barrier and passivation layer studies
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