Aluminum oxide (Al2O3) sputtering targets are solid ceramic oxide sources used in physical vapor deposition (PVD). During sputtering, material is ejected from the target and deposited onto a substrate to form a thin film. Aluminum oxide belongs to the oxide ceramic group, known for its electrical insulation, hardness, and chemical stability.
- Quantity: 1 piece
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- Dielectric and insulating layers in thin-film electronics
- Optical coatings on lenses and glass substrates
- Protective and wear-resistant thin films
- Oxide thin-film research in materials science
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