Aluminum oxide (Al2O3) sputtering targets are ceramic oxide source materials from the advanced ceramics group. They are used in physical vapor deposition (PVD) processes, where sputtering transfers material from the target onto a substrate to form thin films. Aluminum oxide is widely studied for its electrical insulation, chemical stability, and mechanical hardness.
- Quantity: 1 piece
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- Dielectric and insulating thin layers for microelectronics and device research
- Protective and barrier coatings for surface engineering studies
- Optical thin films for coating and photonics research
- Hard coating development for tribology and wear-resistance testing
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