This aluminum oxide (Al2O3) sputtering target is a 3'' disc, 0.125'' thick, with a purity of 99.999%. It serves as the source material for sputter deposition of Al2O3 thin films onto substrates such as silicon wafers, in work ranging from small R&D runs to production batches covering medium to large substrate areas.
Al2O3 is a compound of aluminium and oxygen valued for its chemical inertness, hardness and mechanical strength, high resistance to abrasion and corrosion, high electrical breakdown field and high dielectric constant. Films grown from this target are transparent and insulating, which makes them useful across mechanical, optical and microelectronic fields.
The final film properties depend on how the sputtering system is set up, including sputtering rate, target-to-substrate distance and reactive gas pressures. This range of parameters gives experienced users considerable control over film growth and microstructure.
- Deposition of protective coatings with high hardness and abrasion resistance.
- Fabrication of dielectric and insulating layers in microelectronic devices.
- Production of diffusion barriers and electronic seals.
- Deposition of transparent optical layers for optoelectronic applications.
- Thin film research in tribology, sensorics and nanolithography.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.999% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01AL57
- Material: Aluminum Oxide (Al2O3)
- Size: 3''
- Thickness: 0.125''
- Product code: NG0ST01AL57
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