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Nanografi

Aluminum Oxide (Al2O3) Sputtering Targets

Aluminum Oxide (Al2O3) Sputtering Targets
Regular price Rp 21.245.000,00
Regular price Sale price Rp 21.245.000,00
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Aluminum oxide (Al2O3) is a ceramic oxide material, commonly known as alumina. This product is supplied as a sputtering target, a solid source block used in physical vapor deposition (PVD) to deposit thin films onto substrates. Nanografi's Al2O3 sputtering target belongs to the advanced ceramic and oxide material group.

  • Quantity: 1 piece

For technical specifications, Certificate of Analysis (CoA), or quotation, please contact AMI Scientific.

  • Dielectric and insulating thin films in microelectronic devices
  • Protective and wear-resistant coatings on tools and components
  • Optical coatings for transparent and interference layers
  • Barrier layer development in thin-film and surface engineering research

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