This aluminum oxide (Al2O3) sputtering target from Nanografi is a 99.999% purity disc measuring 3'' in diameter and 0.250'' thick. It serves as the source material for depositing alumina thin films by sputtering, where material is eroded from the target and deposited onto a substrate such as a silicon wafer.
Alumina films are valued for their chemical inertness, hardness and mechanical strength, transparency, resistance to abrasion and corrosion, and their insulating behaviour, including a high electrical breakdown field and high dielectric constant. The final film properties depend on sputtering conditions such as sputtering rate, target-to-substrate distance and reactive gas pressure.
Sputter deposition is a repeatable process that suits small research and development work and can be adapted to production batches covering medium to large substrate areas. Its many adjustable parameters give experienced users considerable control over film growth and microstructure.
- Deposition of dielectric and insulating layers for microelectronic devices.
- Production of protective coatings with high hardness and abrasion and corrosion resistance.
- Fabrication of diffusion barriers and electronic seals.
- Deposition of optical layers for optical and optoelectronic applications.
- Thin film research in tribology, sensorics and nanolithography.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.999% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01AL59
- Material: Aluminum Oxide (Al2O3)
- Size: 3''
- Thickness: 0.250''
- Product code: NG0ST01AL59
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