Aluminum oxide (Al2O3) is an inorganic ceramic oxide belonging to the advanced ceramics class. Sputtering targets are solid source plates used in physical vapor deposition (PVD) processes, where material is ejected from the target and deposited as a thin film onto a substrate.
- Quantity: 1 piece
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- Dielectric and insulating thin films in microelectronics research
- Protective and wear-resistant coatings studied in materials science
- Optical thin-film coatings for laboratory device development
- Barrier layer research in thin-film device fabrication
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