This aluminum oxide (Al2O3) sputtering target is a 4'' diameter disc, 0.125'' thick, with a purity of 99.999%. It serves as the source material for depositing Al2O3 thin films by sputtering, where material is eroded from the target and deposited onto a substrate such as a silicon wafer.
Al2O3 is a compound of aluminium and oxygen known for its hardness, high melting point and chemical inertness. Films grown from this target offer mechanical strength, transparency, high abrasion and corrosion resistance, good insulating behaviour, a high electrical breakdown field and a high dielectric constant. Final film properties depend on sputtering conditions such as sputtering rate, target-to-substrate distance and reactive gas pressure.
Sputter deposition is a repeatable process that can move from small research work to production batches covering medium to large substrate areas, and its many adjustable parameters give close control over film growth and microstructure.
- Deposition of dielectric and insulating layers in microelectronic devices.
- Fabrication of optical layers and transparent coatings.
- Production of protective, wear- and corrosion-resistant coatings.
- Formation of diffusion barriers and electronic seals.
- Thin film research in optoelectronics, tribology, sensorics and nanolithography.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.999% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01AL61
- Material: Aluminum Oxide (Al2O3)
- Size: 4''
- Thickness: 0.125''
- Product code: NG0ST01AL61
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