Aluminum oxide (Al2O3) sputtering targets are solid, dense ceramic plates used as the source material in physical vapor deposition (PVD) to deposit alumina thin films onto substrates. Al2O3 belongs to the oxide ceramics group, which is widely studied for its electrical insulation, mechanical hardness, and chemical stability. This Nanografi product is supplied as a single target for laboratory and pilot-scale sputtering work.
- Quantity: 1 piece
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- Dielectric and insulating layers in thin-film microelectronics research
- Protective and wear-resistant coatings on optical and mechanical components
- Diffusion barrier and passivation layers in multilayer device structures
- Development of oxide thin films for sensor and catalyst support studies
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