Aluminum oxide (Al2O3) is an inorganic ceramic oxide belonging to the advanced technical ceramics group. Sputtering targets are solid source plates used in physical vapor deposition (PVD) to deposit thin films onto substrates. This Nanografi Al2O3 sputtering target is designed for laboratory and research-scale thin-film deposition processes.
- Quantity: 1 piece
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- Dielectric and insulating thin-film layers in electronics research
- Protective and wear-resistant coating development
- Optical thin-film coating studies
- Barrier layer research for surface and materials engineering
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