This aluminum oxide (Al2O3) sputtering target is a 99.999% purity ceramic disc, 4'' in diameter and 0.250'' thick, supplied as a single piece. It serves as the source material for depositing alumina thin films by sputtering, where material is eroded from the target and deposited onto a substrate such as a silicon wafer.
Al2O3 is a compound of aluminium and oxygen known for its chemical inertness, hardness, mechanical strength, high abrasion and corrosion resistance, high electrical breakdown field and high dielectric constant. Films grown from this target combine transparency with insulating and optical properties, making them valuable in mechanical, optical and microelectronic work.
Sputter deposition is repeatable and scales from small R&D runs to production batches covering medium to large substrate areas. Film properties depend on process settings such as sputtering rate, target-to-substrate distance and reactive gas pressure, giving users close control over film growth and microstructure.
- Depositing aluminum oxide dielectric layers for microelectronic devices.
- Producing protective and wear-resistant coatings that benefit from alumina's hardness and corrosion resistance.
- Forming diffusion barriers and electronic seals in thin-film structures.
- Fabricating transparent optical layers for optoelectronic components.
- Research on alumina films for tribology, sensorics and nanolithography.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.999% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01AL63
- Material: Aluminum Oxide (Al2O3)
- Size: 4''
- Thickness: 0.250''
- Product code: NG0ST01AL63
—
—