Aluminum oxide (Al2O3) is a ceramic oxide material from the advanced ceramics group. It is valued for its hardness, electrical insulation, and thermal stability. As a sputtering target, it is a dense solid source used in physical vapor deposition (PVD) to form thin films on substrates in research and industrial processes.
- Quantity: 1 piece
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- Deposition of dielectric and insulating thin films for electronic and semiconductor device research
- Protective and wear-resistant coatings on tools and components
- Optical thin-film coatings for transparent and functional layers
- Thin-film process development for sensors and microelectronic devices
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