Aluminum oxide (Al2O3) sputtering targets are ceramic oxide source materials used in physical vapor deposition (PVD) processes. Aluminum oxide, commonly known as alumina, is a widely studied dielectric and wear-resistant ceramic. In a vacuum chamber, atoms ejected from the target condense on a substrate to form a uniform thin film.
- Quantity: 1 piece
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- Dielectric and insulating layers in thin film electronics research
- Protective and wear-resistant coatings on laboratory substrates
- Optical coatings and barrier layer studies
- Gate dielectric and passivation layer development
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