Aluminum oxide (Al2O3) sputtering targets are solid oxide source materials used in physical vapor deposition (PVD) to deposit thin films onto substrates. Al2O3 belongs to the technical ceramics and metal oxide group, valued for its electrical insulation, mechanical hardness, and chemical stability. In sputtering, the target is bombarded with energetic ions so that its material is ejected and condensed as a uniform film.
- Quantity: 1 piece
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- Dielectric and insulating layers in thin-film electronics research
- Protective and barrier coatings for laboratory and industrial surfaces
- Optical thin-film development
- Fabrication and study of oxide films for sensor and device prototypes
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