Aluminum oxide (Al2O3) is a widely used ceramic oxide known for its hardness, electrical insulation, and chemical stability. It belongs to the class of advanced oxide ceramics used in thin-film technology. Sputtering targets are solid source plates used in physical vapor deposition (PVD), where high-energy ions eject atoms from the target surface so they can deposit as a uniform thin film onto a substrate. This product is supplied by Nanografi as a sputtering target for laboratory and pilot-scale deposition work.
- 1 piece
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- Dielectric and insulating layers in thin-film electronics research
- Optical coatings for anti-reflection and protective layers
- Wear-resistant and corrosion-protective coatings on metal and glass substrates
- Barrier layers in flexible electronics and encapsulation studies
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