Aluminum oxide (Al2O3) sputtering targets are dense solid sources of ceramic oxide material used in physical vapor deposition (PVD) processes. Belonging to the advanced ceramic oxide group, aluminum oxide is valued for its electrical insulation, chemical stability, and hardness, which makes it a common target material for depositing thin films in research settings.
- 1 piece
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- Deposition of dielectric and insulating thin films for electronics research
- Protective and barrier coating studies
- Optical thin-film development
- Surface engineering and materials science laboratory work
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