This aluminum silicon (AlSi) sputtering target from Nanografi is a 1'' disc, 0.125'' thick, with a purity of 99.999%. It serves as the source material in sputter deposition systems, where atoms are eroded from the target and deposited as a thin film onto a substrate such as a silicon wafer.
Sputtering is an established route for coating substrates of many shapes and sizes. Results are repeatable, and a process developed on a small research scale can be carried forward to production batches covering medium to large substrate areas. Depending on the process settings, chemical reactions may take place at the target surface, in flight or on the substrate itself. The large number of adjustable parameters gives experienced users close control over film growth and microstructure.
- Thin film deposition onto substrates such as silicon wafers by sputtering.
- Sputter etching where highly anisotropic etching is required and selectivity is not critical.
- Compositional analysis by etching, as in secondary ion mass spectrometry (SIMS), where sputtered atoms are identified by mass spectrometry and very low impurity levels can be detected.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.999% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01AL79
- Material: Aluminum Silicon (AlSi)
- Size: 1''
- Thickness: 0.125''
- Product code: NG0ST01AL79
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