Aluminum silicon (AlSi) sputtering targets are solid metallic source materials used in physical vapor deposition (PVD). Within the metal alloy group, AlSi is an aluminum-based alloy with silicon added to modify its deposition and film characteristics. During sputtering, energetic ions bombard the target surface and eject atoms that condense onto a substrate to form a thin film.
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- Metallization layers for microelectronics and semiconductor device research
- Thin-film deposition studies for interconnect and contact materials
- Protective and functional coatings for optical and display research
- Materials science experiments on alloy thin films and deposition processes
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