Aluminum silicon (AlSi) sputtering targets are solid metallic alloy sources made from aluminum and silicon. They are used in physical vapor deposition (PVD) processes, particularly magnetron sputtering, to deposit thin alloy films onto substrates for research and development. Because the target is an alloy, the composition of the deposited film depends on the target composition and the sputtering conditions, which makes it useful for studying Al-Si thin films.
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- Metallization and interconnect layer research in microelectronics
- Thin-film deposition studies for semiconductor device prototyping
- Development of protective and reflective coatings
- Surface engineering and materials science research
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