Aluminum silicon (AlSi) sputtering targets are solid alloy source materials used in physical vapor deposition (PVD). In a sputtering process, ions bombard the target surface and eject atoms that condense onto a substrate, forming a thin metallic film. AlSi is a metallic alloy that combines aluminum with silicon, a combination commonly studied for its film-forming and conductive properties.
- Quantity: 1 piece
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- Metallization and interconnect layer research in microelectronics and semiconductor devices
- Thin-film deposition studies for conductive and reflective coatings
- Development of barrier and adhesion layers in multilayer thin-film stacks
- Materials research on alloy film composition and deposition behavior
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