Aluminum Silicon (AlSi) sputtering targets are solid source materials made from an aluminum-silicon alloy, designed for physical vapor deposition (PVD) processes. During sputtering, energetic ions bombard the target surface, ejecting atoms that deposit onto a substrate to form thin metallic films. As a metallic alloy, AlSi targets are commonly used where conductive and uniform aluminum-based layers are required.
- Quantity: 1 piece
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- Thin-film metallization for microelectronic and semiconductor device research
- Conductive interconnect and contact layer development
- Reflective and optical coating studies
- Protective and decorative metallic coatings on glass and polymer substrates
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